About JOSEPH C NABITY
JC Nabity Lithography Systems provides the Nanometer Pattern Generation System (NPGS), a top-selling SEM lithography system used for advanced electron beam and ion beam lithography. The system is widely adopted in research institutions globally and is known for its versatility and ease of use.
Direct write lithography using commercial SEM, STEM, FIB, dual beam, or Helium Ion microscopesSupports pattern design with QCAD (via NPGS v9.2 upgrade)Direct write Pt patterning using EBID (Electron Beam Induced Deposition)Template stripped nanostructures creation
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